A parametric study reveals more sustainable etch dynamics, chromium mask selectivity, and pathways toward zero-global-warming ...

Mass spectrometry, by contrast, is a powerful technique for the analysis of any process gas. Careful consideration of differences in pressure, reaction time scales and process flow is essential for ...

Add Yahoo as a preferred source to see more of our stories on Google. Imagine trying to carve a tiny, complex sculpture into a block the size of your fingernail again ...

In this interview, AZoM talks to Bas Derksema about advancements in plasma etching and deposition processes for compound semiconductor materials applications. Please could you introduce yourself and ...

Plasma chemistry and etching processes form the backbone of modern semiconductor fabrication, enabling the precise patterning and removal of material layers essential to device performance. By ...

A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...

Dr. Ho Jin Ma's research team from the Nano Materials Research Division at the Korea Institute of Materials Science (KIMS), in collaboration with Professor Jeong-Woo Lee's research team from Pusan ...

The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in. 2 of ...

MUNICH, Germany — Asyntis GmbH, a two-year old supplier of plasma etch equipment for semiconductor manufacturing, has raised 4 million euro (about $4.35 million) in a second round of financing that ...

PARIS – For the year 2006, the silicon epitaxy sector recorded a 92-percent growth. This contrasts significantly with the 24-percent growth for the entire semiconductor equipment market, according to ...

All variants of dry etching processes use plasma, which is why dry etching is often referred to as plasma etching. Ion milling and sputter etching use a beam of ions to eject or vaporize material ...